Acta mathematica scientia, Series B >
APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS
Received date: 2006-12-30
Revised date: 2008-02-10
Online published: 2010-01-20
Supported by
This research was partially supported by the NSF of China (10671080), NCET (06-672) and the Key Project of Chinese Ministry of Education (105119).
In this article, we consider the characterization problem in design theory. The objective is to characterize minimum
projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection uniformity (MPU) rule to assess and compare two-level factorials.
SONG Shuo , QIN Hong . APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS[J]. Acta mathematica scientia, Series B, 2010 , 30(1) : 180 -186 . DOI: 10.1016/S0252-9602(10)60035-5
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